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> NV-GSD-HC3   > NV-GSDIII-180
> HC3-180  
SHX is the single wafer type high current ion implanter from Sumitomo Heavy Industries Ion Technology, the top ion implanter manufacturer in Japan, based on a completely new concept for single wafer high current implanter, covering Ultra Shallow Junction processes for coming 20nm node generations. SHX is the world's first single wafer high current ion implanter with the combination of electrostatic and mechanical scanning of spot beam, realizing the incomparable high quality in low energy ion implantation necessary for the coming high quality source/drain extension implantations.

  • For 300mm/200mm wafers
  • Application to coming process of 20nm node
  • High beam current at 200eV for commercial productions
  • Realization of high precision source/drain extension implantations through,
    • Incomparable uniformity over a wafer, including beam sizes and beam divergent angles, and
    • High quality of beam parallelism and repeatability within a wafer, making multiple-step implantations to compensate angle deviations and non-uniformity not necessary
  • High energy purity equivalent to drift mode implantation at ultra-low energy, attained through an outstanding energy filter mechanism after deceleration
  • Metal contamination and cross contamination minimized
  • Outstanding plasma shower system for wafer charging control
  • High reliability and easy maintenance

Sumitomo Heavy Industries Ion Technology Co., Ltd.